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IWN 2022
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Poster Session
Poster Session 2
Electronic devices
Termin
Datum:
11.10.2022
Zeit:
13:15
–
15:30
Ort / Stream:
Topic Electronic devices
Programm
Poster Presentation
PP 131
High-performance E-Mode
p
-Channel GaN FinFETs on silicon substrate
Dr. Hanghai Du (Xidian University / CN)
Electronic devices
Poster Presentation
PP 132
Technological challenges in the development of a normally-off monolithically integrated bidirectional GaN-based switch
Jasmin Ehrler (RWTH Aachen / DE)
Characterization, Electronic devices
Poster Presentation
PP 133
High-breakdown-voltage (> 3000 V) and low-power-dissipation Al
0.3
Ga
0.7
N/GaN/Al
0.1
Ga
0.9
N double-heterostructure HEMTs with ohmic / Schottky hybrid drains and Al
2
O
3
/SiO
2
passivation
Dr. Yutong Fan (Xidian University / CN)
Electronic devices
Poster Presentation
PP 134
Sputtering epitaxial preparation of AlN/Al
0.5
Ga
0.5
N HEMTs with heavily Si-doped degenerate GaN contacts
Professor Hiroshi Fujioka (The University of Tokyo / JP)
Electronic devices, Growth
Poster Presentation
PP 135
On the formation mechanism of Au-free ohmic contacts for AlGaN/GaN-HEMTs
Valentin Garbe (TU Bergakademie Freiberg / DE)
Characterization, Electronic devices
Poster Presentation
PP 137
Improvement of the thermal performance of the GaN-on-Si RF transistors by introducing a GNOI structure
Dr. Lu Hao (Xidian university / CN)
Electronic devices
Poster Presentation
PP 138
UWBG Al0.45Ga0.55N channel heterostructure field effect transistors with AlGaN back-barrier
Kamal Hussain (University of South Carolina / US)
Characterization, Electronic devices
Poster Presentation
PP 139
Progress in novel co-doping moieties to achieve enhanced P-type doping in GaN by ion implantation
Dr. Alan Jacobs (US Naval Research Laboratory / US)
Electronic devices, Novel Materials and Nanostructures
Poster Presentation
PP 140
Flexible AlGaN/GaN HEMTs on PET with Gauge Factor 1800
Prof. Dr. Asif Khan (University of South Carolina / US)
Characterization, Electronic devices
Poster Presentation
PP 141
Low damage etching of nitride semiconductors
Christian Miersch (Fraunhofer Institute of Integrated Systems and Devices / DE)
Electronic devices, Novel Materials and Nanostructures
Poster Presentation
PP 142
InGaN-Based resonant cavity Light-Emitting Diodes in red spectral region
Dr. Wei Ou (School of Electronic Science and Engineering / CN)
Electronic devices, Optical devices
Poster Presentation
PP 143
Effect of GaN buffer thickness on the electrothermal performance of AlGaN/GaN HEMTs on engineered substrates
Dr. Marko Tadjer (Naval Research Laboratory / US)
Characterization, Electronic devices
Poster Presentation
PP 146
High breakdown voltage (>2700V) AlGaN-Channel HEMTs with high stability
Yu Wen (Xidian University / CN)
Electronic devices, Novel Materials and Nanostructures
Poster Presentation
PP 147
Strained channel AlN/GaN heterostructures homoepitaxially grown on AlN-on-sapphire template by plasma-assisted molecular beam epitaxy
Dr. Jiajia Yao (Xidian University / CN)
Electronic devices, Growth
Poster Presentation
PP 148
Enhancement-mode (11-22) semi-polar GaN lateral MOSFETs using crystallographic wet etching technique
Yidi Yin (The University of Sheffield / GB)
Characterization, Electronic devices
Poster Presentation
PP 149
Crystal-plane dependent influence of TMAH on trench etching for GaN Schottky and p-n diodes
Thorsten Zweipfennig (RWTH Aachen University / DE)
Electronic devices, Growth
Poster Presentation
PP 149a
Depletion- and enhancement-mode p-Channel MISHFET based on p-GaN/GaN/AlGaN heterostructures
Professor Andrei Vescan (RWTH Aachen University / DE)
Characterization, Electronic devices
Poster Presentation
PP 150
Cu/Pd
2
Si Schottky contacts to AlGaN/GaN-on-Si HEMT heterostructures
Dr. Marek Wzorek (Łukasiewicz Research Network / PL)
Characterization, Electronic devices
v1.25.0
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