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IWN 2022
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Session
Session – Growth
AlN HT annealing
Appointment
Date:
11/10/2022
Time:
08:30
–
10:00
Location / Stream:
Salon Moskau
Chair
Professor Marc Hoffmann
ams-Osram / DE
Programme
08:30
–
09:00
25 Min.
5 Min.
Invited Talk
IT 16
Growth on high temperature annealed AlN/sapphire templates – challenges and opportunities
Dr. Sylvia Hagedorn (Ferdinand-Braun-Institut gGmbH / DE)
09:00
–
09:30
25 Min.
5 Min.
Invited Talk
IT 17
Fabrication of high-quality AlN templates by Face-to-face annealing of sputter-deposited films
Professor Hideto Miyake (Mie University / JP)
09:30
–
09:45
12 Min.
3 Min.
Abstract Talk
AT 121
Formation and role of voids in the recovery of sputtered AlN during high temperature annealing
Dr. Martin Albrecht (Leibniz-Institut für Kristallzüchtung / DE)
Characterization, Growth
09:45
–
10:00
12 Min.
3 Min.
Abstract Talk
AT 056
Growth and high-temperature annealing of
a
-Plane AlN templates
Christoph Margenfeld (Technische Universität Braunschweig / DE)
Growth, Optical devices
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