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Abstract Talk
AT 121

Formation and role of voids in the recovery of sputtered AlN during high temperature annealing

Appointment

Date: 11/10/2022

Time: 09:30 – 09:45

Talk time: 12 Min.

Discussion time: 3 Min.

Location / Stream:

Session

AlN HT annealing

Topics

Characterization
Growth

Authors

Leonardo Cancellara (Leibniz-Institut für Kristallzüchtung / DE), Dr. Sylvia Hagedorn (Ferindand Braun Institut gGmbH / DE), Dr. Sebastian Walde (Ferindand Braun Institut gGmbH / DE), Dr. Dominik Jaeger (Evatec / CH), Dr. Martin Albrecht (Leibniz-Institut für Kristallzüchtung / DE)