Session – Growth
AlN HT annealing

Programm

• 08:30 – 09:00 25 Min. 5 Min.

  • Invited Talk
  • IT 16

  Growth on high temperature annealed AlN/sapphire templates – challenges and opportunities

  • Dr. Sylvia Hagedorn (Ferdinand-Braun-Institut gGmbH / DE)
• 09:00 – 09:30 25 Min. 5 Min.

  • Invited Talk
  • IT 17

  Fabrication of high-quality AlN templates by Face-to-face annealing of sputter-deposited films

  • Professor Hideto Miyake (Mie University / JP)
• 09:30 – 09:45 12 Min. 3 Min.

  • Abstract Talk
  • AT 121

  Formation and role of voids in the recovery of sputtered AlN during high temperature annealing

  • Dr. Martin Albrecht (Leibniz-Institut für Kristallzüchtung / DE)

   Characterization, Growth
• 09:45 – 10:00 12 Min. 3 Min.

  • Abstract Talk
  • AT 056

  Growth and high-temperature annealing of a-Plane AlN templates

  • Christoph Margenfeld (Technische Universität Braunschweig / DE)

   Growth, Optical devices