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Poster Presentation
PP 155

The dependence of the V/III ratio in high-temperature AlN growth with several misorientations off-angle sapphire substrates

Termin

Datum: 11.10.2022

Zeit: 13:15 – 13:15

Redezeit: 0 Min.

Diskussionszeit: 0 Min.

Ort / Stream:

Topic Growth

Session

Growth

Thema

Growth

Mitwirkende

Atsushi Tomita (Tokushima University / JP), Shota Tsuda (Tokushima University / JP), Takumi Miyagawa (Tokushima University / JP), Professor Hideki Hirayama (Tokushima University / JP; RIKEN / JP), Yuusuke Takashima (Tokushima University / JP), Yoshiki Naoi (Tokushima University / JP), Professor Kentaro Nagamatsu (Tokushima University / JP)