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IWN 2022
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Invited Talk
IT 14
Selective-area p-type doping by ion implantation with ultra-high-pressure annealing and its device applications
Invited Speaker
Professor Tetsu Kachi
Nagoya University / JP
Appointment
Date:
11/10/2022
Time:
08:30
–
09:00
Talk time:
25 Min.
Discussion time:
5 Min.
Location / Stream:
Salon Rome
Session
Ion implantation and annealing
v1.25.0
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