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Dr. Po-Jung Lin

GlobalWafers / TW

GlobalWafers

Vortrag

12.10.2022
Poster Presentation
PP 355
Suppressing p-type parasitic channel generation at the interface of an aluminum nitride nucleation layer and a high resistivity silicon substrate
Characterization, Growth

Weitere Beteiligungen

12.10.2022
Poster Presentation
PP 355
Suppressing p-type parasitic channel generation at the interface of an aluminum nitride nucleation layer and a high resistivity silicon substrate
Characterization, Growth