Abstract text (incl. figure legends and references)

Introduction & Objectives

Imaging beam-sensitive materials at low-dose conditions remains a very challenging topic in transmission electron microscopy (TEM), especially if the goal is the direct observation of the atomic structure in these materials. In particular, electron beam induced damage during image tuning can make visualizing the sample at atomic resolution an extremely difficult task.

Methods & Results

In this presentation we will discuss a new ultra-high contrast Scanning transmission electron microscopy (STEM) technique that has recently become available on JEOL TEMs called optimum bright-field (OBF) STEM [1]. This method works with both segmented as well as pixelated STEM detectors and has been shown to be highly dose efficient while at the same time allowing for real-time imaging under low-dose conditions. The capability to image beam sensitive materials in real time under low-dose conditions promises to make TEM work on these materials significantly easier.

Outlook

Here we will give a brief overview of the OBF STEM Method and present several application examples on different materials highlighting the performance and capabilities of this new imaging technique.

References

[1] Kousuke Ooe et al., Ultramicroscopy 220, 2021, 113133