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Abstract Talk
AT 078

Scaling up and excellent uniformity of 300 mm GaN-on-Si epitaxy for micro LED applications

Appointment

Date: 11/10/2022

Time: 11:45 – 12:00

Talk time: 12 Min.

Discussion time: 3 Min.

Location / Stream:

Salon Moskau

Session

Vertical GaN Processing

Topics

Growth
Optical devices

Authors

Dr. Atsushi Nishikawa (ALLOS Semiconductors GmbH / DE), Alexander Loesing (ALLOS Semiconductors GmbH / DE), Burkhard Slischka (ALLOS Semiconductors GmbH / DE)